Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

Other Related Categories

C355S072000, C355S075000, C250S492200, C356S400000

Type

Reexamination Certificate

Status

active

Patent number

07136148

Description

ABSTRACT:
A lithographic apparatus includes an illumination system configured to condition a radiation beam, and a support structure constructed to support a patterning device. The patterning device imparts the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system projects the patterned radiation beam onto a target portion of the substrate. An interferometer system measures a position of the substrate table, and generates a disturbance frequency by optical feedback. A position control system controls the position of the support structure and the substrate table on the basis of the position measurement of the interferometer system. The position control system selects a substrate table speed to prevent a positioning error due to the disturbance frequency.

REFERENCES:
patent: 6233040 (2001-05-01), Sekiguchi
patent: 6727977 (2004-04-01), Butler
patent: 2005/0168754 (2005-08-01), Hill

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