Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-06-06

2006-06-06

Tokar, Michael (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

Reexamination Certificate

active

07057702

ABSTRACT:
A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.

REFERENCES:
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 5900354 (1999-05-01), Batchelder
patent: 6700641 (2004-03-01), Shiraishi
patent: 6788477 (2004-09-01), Lin

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