Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C355S067000, C355S072000, C355S075000, C430S311000, C430S322000, C250S492100, C250S492200, C250S548000

Reexamination Certificate

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07148949

ABSTRACT:
In a purge gas system for a lithographic apparatus, a rate of flow of purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control may be on the basis of a detected level of contamination or on the basis of a timetable.

REFERENCES:
patent: 6522384 (2003-02-01), Miwa
patent: 6638672 (2003-10-01), Deguchi
patent: 6710845 (2004-03-01), Wu et al.
patent: 2002/0083409 (2002-06-01), Hamm
patent: 2003/0035087 (2003-02-01), Murayama
patent: 1 143 491 (2001-10-01), None
patent: 1 160 839 (2001-12-01), None
patent: 9-306825 (1997-11-01), None
patent: 11-202496 (1999-07-01), None
patent: 2001-189268 (2001-07-01), None

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