Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-11-07

2006-11-07

Perkey, W. B. (Department: 2851)

Robots

End effector

Vacuum or mangetic

C355S072000

Reexamination Certificate

active

07131999

ABSTRACT:
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a robot configured to transfer an exchangeable object to and from a support region, the robot including an arm and an end effector, the end effector including a first and second carrier configured to carry respective exchangeable objects, and the end effector being rotatably connected to the arm of the robot around a rotation axis which extends substantially parallel to the support region.

REFERENCES:
patent: 4722659 (1988-02-01), Hoyt et al.
patent: 5135349 (1992-08-01), Lorenz et al.
patent: 6158951 (2000-12-01), Carr et al.
patent: 2003/0017034 (2003-01-01), Davis et al.
patent: 2004/0005211 (2004-01-01), Lowrance et al.

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