Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-01-17

2006-01-17

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492220, C355S030000, C355S067000, C355S077000, C438S795000

Reexamination Certificate

active

06987275

ABSTRACT:
A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.

REFERENCES:
patent: 4408338 (1983-10-01), Grobman
patent: 4866517 (1989-09-01), Mochizuki et al.
patent: 2002/0090054 (2002-07-01), Sogard
patent: 1 211 918 (2002-06-01), None
patent: WO 01/79936 (2001-10-01), None

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