Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-04-11

2006-04-11

Wells, Nikita (Department: 2881)

Radiant energy

Ion generation

Field ionization type

C250S492220, C250S50400H, C250S365000, C250S461100

Reexamination Certificate

active

07026629

ABSTRACT:
A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.

REFERENCES:
patent: 2001/0006217 (2001-07-01), Bisschops
patent: 1 150 169 (2001-10-01), None
patent: WO01/49086 (2001-07-01), None
patent: WO01/95362 (2001-12-01), None
patent: WO 02/31932 (2002-04-01), None

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