Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Detailed holder for original

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000, C355S072000

Reexamination Certificate

active

07027132

ABSTRACT:
A lithographic apparatus includes an article support for supporting a substantially flat article to be placed in a beam path of a beam of radiation. The article support includes a plurality of supporting protrusions that define a support zone for providing a plane of support. A backfill gas feed is arranged in the support zone and provides a backfill gas that flows to a backside of the article when supported by the article support. The support zone is surrounded by a boundary zone that has a reduced height relative to the plane of support so that the backfill gas flow is permitted to exit the support zone. A tunable clamp clamps the article to the article support, and a flow measuring system measures the outflow of the backfill gas. The tunable clamp is operatively coupled to the flow measuring system to tune the clamping based on the measured outflow.

REFERENCES:
patent: 5777838 (1998-07-01), Tamagawa et al.
patent: 6033478 (2000-03-01), Kholodenko
patent: 6570752 (2003-05-01), Morita et al.
patent: 6584168 (2003-06-01), Hara et al.
patent: 6628503 (2003-09-01), Sogard
patent: 6710857 (2004-03-01), Kondo
patent: 6897945 (2005-05-01), Ottens et al.
patent: 6905984 (2005-06-01), Kellerman et al.
patent: 2001/0005595 (2001-06-01), Morita et al.
patent: 2002/0101956 (2002-08-01), Hara et al.
patent: 0 498 752 (1992-08-01), None
patent: 0 840 434 (1998-05-01), None
patent: 0 840 434 (1998-11-01), None
patent: 0 947 884 (1999-10-01), None
patent: 0 993 024 (2000-04-01), None
patent: 0 947 884 (2001-07-01), None
patent: 0 993 024 (2002-07-01), None
patent: 1 241 706 (2002-09-01), None
patent: 1 241 706 (2004-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3579844

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.