Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2006-09-26
2006-09-26
Fuller, Rodney (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S055000, C355S063000, C355S077000
Reexamination Certificate
active
07113259
ABSTRACT:
In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have different first and second indices of refraction, respectively. The first fluid is provided between a substrate and the transparent plate and has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided between the transparent plate and the optical element and has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction and may be equal to the first index of refraction or the second index of refraction.
REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.
patent: 3648587 (1972-03-01), Stevens
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4396705 (1983-08-01), Akeyama et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5040020 (1991-08-01), Rauschenbach et al.
patent: 5121256 (1992-06-01), Corle et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5900354 (1999-05-01), Batchelder
patent: 6191429 (2001-02-01), Suwa
patent: 6560032 (2003-05-01), Hatano
patent: 6600547 (2003-07-01), Watson et al.
patent: 6603130 (2003-08-01), Bisschops et al.
patent: 6633365 (2003-10-01), Suenaga
patent: 6809794 (2004-10-01), Sewell
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0123040 (2003-07-01), Almogy
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0021844 (2004-02-01), Suenaga
patent: 224448 (1985-07-01), None
patent: 242880 (1987-02-01), None
patent: 0023231 (1981-02-01), None
patent: 0418427 (1991-03-01), None
patent: 1039511 (2000-09-01), None
patent: 2 474 708 (1981-07-01), None
patent: 58-202448 (1983-11-01), None
patent: 62-65326 (1987-03-01), None
patent: 62-121417 (1987-06-01), None
patent: 63-157419 (1988-06-01), None
patent: 4-305915 (1992-10-01), None
patent: 4-305917 (1992-10-01), None
patent: 6-124873 (1994-05-01), None
patent: 7-220990 (1995-08-01), None
patent: 10-228661 (1998-08-01), None
patent: 10-255319 (1998-09-01), None
patent: 10-303114 (1998-11-01), None
patent: 10-340846 (1998-12-01), None
patent: 2001-91849 (2001-04-01), None
patent: WO99/49504 (1999-09-01), None
patent: WO 2004/019128 (2004-03-01), None
S. Owa et al., “Potential performance and feasibility of immersion lithography,” NGL Workshop 2003, Jul. 10, 2003.
H. Hogan, “New Semiconductor Lithography Makes a Splash,” Photonics TechnologyWord, Oct. 2003, pp. 1-3.
M. Switkes et al., “Immerson Lithography at 157 nm,” MIT Lincoln Lab, Orlando 2001-1, Dec. 17, 2001.
M. Switkes et al., “Immerson Lithography at 157 nm,” J. Vac. Sci. Technol. B., vol. 19, No. 6, Nov./Dec. 2001, pp. 2353-2356.
M. Switkes et al., “Immersion Lithography: Optics for the 50 nm Node,” 157 Anvers-1, Sep. 4, 2002.
B. J. Lin, “Drivers, Prospects, and Challenges for Immersion Lithography,” tsmc, Inc., Sep. 2002.
B.J. Lin, “Proximity Prnting Through Liquid,” IBM Technical Disclosure Bulletin, vol. 20, No. 11B, Apr. 1978, p. 4997.
B.J. Lin, “The Paths To Subhalf-Micrometer Optical Lithography,” SPIE vol. 922, Optical/Laser Microlithography (1988), pp. 256-269.
G.W.W. Stevens, “Reduction of Waste Resulting from Mask Defects,” Solid State Technilogy, Aug. 1978, vol. 21 008, pp. 68-72.
T. Matsuyama et al., “Nikon Projection Lens Update,” Nikon Corporation, (date unknown).
S. Owa et al., “Immersion lithography; its potential performance and issues,” SPIE Microlithography, 5040-186, Feb. 27, 2003.
Nikon Precision Europe GmbH, “Investor Relations—Nikon's Real Solutions”, May 15, 2003.
H. Kawata et al., “Optical Projection Lithography using Lenses with Numerical Apertures Greater then Unity,” Microelectronic Engineering 9 (1989), pp. 31-36.
J.A. Hoffnagle et al., “Liquid Immersion Deep-Ultraviolet Interferometric Lithography,” J. Vac. Sci. Technol. B., vol. 17(6), Nov./Dec. 1999.
B.W. Smith et al., Immersion Optical Lithography at 193nm, Future Fab International, Issue 15, Jul. 11, 2003.
H. Kawata et al., “Fabrication of 0.2μm Fine Patterns Using Optical Projection Lithography with an Oil Immersion Lens,” Jpn. J. Appl. Phys. vol. 31 (1992), pp. 4174-4177.
G. Owen et al., 1/8μm Optical Lithography, J. Vac. Sci. Technol. B., vol. 10, No. 6, Nov./Dec. 1992, pp. 3032-3036.
Owa et al., “Advantage and feasibility of immersion lithography”, Nikon Corporation, (date unknown).
U.S. Appl. No. 10/705,783, filed Nov. 12, 2003, Lof et al.
U.S. Appl. No. 10/743,271, filed Dec. 23, 2003, Van Santen et al.
U.S. Appl. No. 10/743,266, filed Dec. 23, 2003, Mulkens et al.
U.S. Appl. No. 10/724,402, filed Dec. 1, 2003, Simon et al.
U.S. Appl. No. 10/705,804, filed Nov. 12, 2003, Desmit et al.
U.S. Appl. No. 10/705,785, filed Nov. 12, 2003, Derksen et al.
U.S. Appl. No. 10/715,116, filed Nov. 18, 2003, Bleeker.
U.S. Appl. No. 10/719,683, filed Nov. 24, 2003, Streefkerk et al.
U.S. Appl. No. 10/705,816, filed Nov. 12, 2003, Lof et al.
U.S. Appl. No. 10/705,805, filed Nov. 12, 2003, Lof et al.
Doering John
Flagello Donis
ASML Netherlands B.V.
Fuller Rodney
Pillsbury Winthrop Shaw & Pittman LLP
LandOfFree
Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3574734