Lithographic apparatus and a method of calibrating such an...

Details Lithographic apparatus and a method of calibrating such an... Lithographic apparatus and a method of calibrating such an...

2007-10-16

2007-10-16

Lyons, Michael A. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

11101629

ABSTRACT:
A lithographic apparatus includes an object support configured to support an object. The apparatus further includes X, Y and Z interferometer measurement systems, and an object support positioning system configured to position the object support in a number of degrees of freedom on the basis of measurements of the interferometer measurement systems. A calibration device is configured to measure Ry of the object support with the X interferometer measurement system in at least two different Z positions, measure Ry of the object support with the Z interferometer measurement system in at least two different Z positions, calibrate a linear Z dependency of Ry on the basis of the measurements, and calibrating a linear X dependency of Z on the basis of the previous calibration. Similarly, a linear Y dependency of Z is calibrated.

REFERENCES:
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 6020964 (2000-02-01), Loopstra et al.
patent: 7016049 (2006-03-01), Kurosawa
patent: 2005/0190375 (2005-09-01), Akimoto
patent: 1 420 300 (2004-05-01), None
patent: WO99/49504 (1999-09-01), None

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