Lithographic apparatus and a measurement system

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S052000, C355S055000

Reexamination Certificate

active

06940587

ABSTRACT:
A measurement system configured to measure wave front aberrations of a projection system, as well as a lithographic apparatus including such a measurement system, is provided wherein the measurement system includes a diffractive element and structure configured to increase the pupil filling of the radiation in the pupil of the projection system, both movable into the projection beam between a radiation system and the projection system, and a sensor module configured to sense radiation that has traversed the projection system to measure wave front aberrations of the projection system.

REFERENCES:
patent: 6650399 (2003-11-01), Baselmans et al.
patent: 2002/0145717 (2002-10-01), Baselmans et al.
patent: 10109929 (2001-11-01), None
patent: 0961149 (1999-12-01), None
patent: 1231514 (2002-08-01), None
European Search Report dated Jul. 31, 2003.

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