Lithographic apparatus and a device manufacturing method

Details Lithographic apparatus and a device manufacturing method Lithographic apparatus and a device manufacturing method

2006-10-24

2006-10-24

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S075000

Reexamination Certificate

active

07126664

ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.

REFERENCES:
patent: 6333775 (2001-12-01), Haney et al.
patent: 6545745 (2003-04-01), Haney et al.
patent: 6842221 (2005-01-01), Shiraishi
patent: 2005/0275835 (2005-12-01), Sogard

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