Lithographic apparatus and a device manufacturing method

Details Lithographic apparatus and a device manufacturing method Lithographic apparatus and a device manufacturing method

2008-01-01

2008-01-01

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

C378S034000, C378S035000, C250S492200, C250S491100

Reexamination Certificate

active

07315032

ABSTRACT:
A lithographic apparatus including an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; at least one mounting bracket configured to couple a second part of the apparatus to a first part thereof, the mounting bracket including a first rigid part, a second rigid part, and an elastic part connecting the first and second rigid parts, wherein a fixing mechanism is provided to fix the positions of the first rigid part and the second rigid part with respect to each other, the elastic part being less rigid than each of the rigid bracket parts, and the fixing mechanism is configured to couple the first and second rigid parts of the mounting bracket substantially by form fixation.

REFERENCES:
patent: 5775666 (1998-07-01), Tsukamoto et al.
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patent: 2002/0089657 (2002-07-01), Okubo
patent: 2002/0118346 (2002-08-01), Galburt et al.
patent: 2002/0163631 (2002-11-01), Sogard
patent: 2003/0164931 (2003-09-01), Galburt et al.

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