Lithographic apparatus, alignment method and device...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C356S400000, C356S401000

Reexamination Certificate

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06914664

ABSTRACT:
To align between layers having a large Z separation, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side.

REFERENCES:
patent: 4758864 (1988-07-01), Endo et al.
patent: 5440138 (1995-08-01), Nishi
patent: 5796483 (1998-08-01), Nakayama
patent: 5950093 (1999-09-01), Wei
patent: 6093618 (2000-07-01), Chen et al.
patent: 6417922 (2002-07-01), Dirksen et al.
patent: 1 148 390 (2001-10-01), None
patent: 1 223 469 (2002-07-01), None
Wong et al., “Experimental and Simulation Studies of Alignment Marks,”SPIE Optical/Laser Microlithography IV, 1463:315-323 (1991) (Abstract No. XP-000988982).

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