Lithographic apparatus, a device manufacturing method, and a...

Details Lithographic apparatus, a device manufacturing method, and a... Lithographic apparatus, a device manufacturing method, and a...

2007-02-06

2007-02-06

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000

Reexamination Certificate

active

10878624

ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a fastener for fastening a first part of the apparatus to a second part of the apparatus. The fastener includes at least one integrated spring.

REFERENCES:
patent: 5207544 (1993-05-01), Yamamoto et al.
patent: H1588 (1996-09-01), Arney
patent: 6019556 (2000-02-01), Hess
patent: 6318939 (2001-11-01), Avaux
patent: 6878042 (2005-04-01), Oshino

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