Lithographic apparatus

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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Details

C355S030000, C355S072000, C359S509000

Reexamination Certificate

active

07148951

ABSTRACT:
A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.

REFERENCES:
patent: 6721031 (2004-04-01), Hasegawa et al.
patent: 6721032 (2004-04-01), Hasegawa et al.
patent: 6867844 (2005-03-01), Vogel et al.
patent: 6970228 (2005-11-01), Aoki et al.
patent: 2002/0191163 (2002-12-01), Hasegawa et al.
patent: 1 229 573 (2002-08-01), None
patent: 1 447 716 (2004-08-01), None
patent: 1 447 716 (2005-01-01), None
patent: 1 600 818 (2005-11-01), None
European Search Report issued for European Patent Application No. 05077375.3-2222, dated Mar. 6, 2006.

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