Lithographic apparatus

Details Lithographic apparatus Lithographic apparatus

1978-05-12

1980-03-18

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 3700

Patent

active

041941233

ABSTRACT:
There is described an apparatus for use in high resolution lithographic techniques. The apparatus includes a microchannel array plate for providing a large area electron source with small divergence angle. The electrons can be used directly, in transmission electron lithography, or as a source for producing x-rays for x-ray lithography. The microchannel array plate is used to control the divergence angle of the electrons (especially in the transmission electron lithography technique) as well as the x-rays (in x-ray lithography techniques). That is, in the x-ray lithography technique the microchannel array plate collimates x-rays which are generated in response to electrons striking a suitable source.

REFERENCES:
patent: 3717785 (1973-02-01), Guernet
patent: 3743842 (1973-07-01), Smith et al.
patent: 3886367 (1975-05-01), Castle
patent: 3947687 (1976-03-01), Fenstermacher
patent: 4124802 (1978-11-01), Terasawa et al.

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