Photocopying – Projection printing and copying cameras – Focus or magnification control
Reexamination Certificate
2004-03-05
2008-03-18
Nguyen, Henry Hung (Department: 2851)
Photocopying
Projection printing and copying cameras
Focus or magnification control
C355S067000
Reexamination Certificate
active
07345739
ABSTRACT:
A lithographic apparatus equipped with an improved alignment system, is presented herein. In one embodiment, the apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device that configures the projection beam according to a desired pattern, a substrate holder for holding a substrate, projection system for projecting the patterned beam onto a target portion of the substrate, and an alignment system. The alignment system includes a radiation source for illuminating at least one mark which is usable for alignment on a substrate and an imaging system for imaging light which has interacted with the at least one mark to generate alignment information.
REFERENCES:
patent: 4697087 (1987-09-01), Wu
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5371570 (1994-12-01), Morris et al.
patent: 5477057 (1995-12-01), Angeley et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5559601 (1996-09-01), Gallatin et al.
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6297876 (2001-10-01), Bornebroek
patent: 6563565 (2003-05-01), Nishi
patent: 6901090 (2005-05-01), Ohtsuki
patent: 2001/0008273 (2001-07-01), Groeneveld et al.
patent: 1 134 618 (2001-09-01), None
patent: 7-094390 (1995-04-01), None
patent: 8-190202 (1996-07-01), None
patent: 9-113742 (1997-05-01), None
patent: 9-306813 (1997-11-01), None
patent: 2001-281490 (2001-10-01), None
patent: 2002-202462 (2002-07-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 98/39689 (1998-09-01), None
patent: WO 98/40791 (1998-09-01), None
patent: WO 02/071142 (2002-09-01), None
European Search Report dated Aug. 14, 2003.
Austrian Search Report issued for Singapore Patent Application No. 200401075-4, dated Jul. 31, 2006.
English translation of Office Action issued in Japanese Patent Appl. No. 2004-061646 dated Mar. 12, 2007.
'T Hooft Gert Wim
Hendriks Robert Frans Maria
Lenderink Egbert
Monshouwer Rene
Van Der Lee Alexander Marc
ASML Netherlands B.V.
Koninklijke Philips Electronics , N.V.
Nguyen Henry Hung
Pillsbury Winthrop Shaw & Pittman LLP
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