Lithograph with one-dimensional trigger mask and method of...

Radiation imagery chemistry: process – composition – or product th – Holographic process – composition – or product

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S002000, C359S035000, C359S009000

Reexamination Certificate

active

07413830

ABSTRACT:
The present invention relates to a method of producing digital holograms in a storage medium, in which the technical problem of writing computer-generated holograms by means of optical lithography as quickly as possible and with little effort with simultaneous accurate control of the timed triggering and the positioning of the write beam is achieved in that a write beam is focused onto the storage medium and moved one-dimensionally relative to the storage medium, in that a scanning beam is focused onto a trigger mask having a plurality of trigger lines and moved one-dimensionally transversely relative to the trigger lines, the movement of the scanning beam being coupled with the movement of the write beam, in that, during the scanning of the trigger lines, a timed trigger signal is generated as a function of the arrangement of the trigger lines, in that, with the aid of the timed trigger signal, the intensity of the write beam on the storage medium is controlled, and in that the hologram is written line by line by introducing radiation energy point by point, the storage medium being displaced transversely with respect to the scanning direction of the lines by a predefined distance to write adjacent lines of the hologram.The technical problem is also solved by a lithograph for producing digital holograms.

REFERENCES:
patent: 3925785 (1975-12-01), Firlion
patent: 4312590 (1982-01-01), Harbaugh
patent: 4393411 (1983-07-01), Amtower
patent: 4688932 (1987-08-01), Suzuki
patent: 5289407 (1994-02-01), Strickler et al.
patent: 5617500 (1997-04-01), Shionoya et al.
patent: 5822092 (1998-10-01), Davis
patent: 6768562 (2004-07-01), Takada et al.
patent: 7123340 (2006-10-01), Noehte et al.
patent: 2004/0136040 (2004-07-01), Noehte et al.
patent: 2004/0173761 (2004-09-01), Noehte et al.
patent: 2004/0257629 (2004-12-01), Noehte et al.
patent: 0 947 884 (1999-10-01), None
patent: 0 950 924 (1999-10-01), None
patent: 0 965 888 (1999-12-01), None
Langlois et al., ‘Diffractive optical elements fabricated by direct laser writing and other techniques' Proc. SPIE vol. 1751., pp. 2-12 (1992).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithograph with one-dimensional trigger mask and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithograph with one-dimensional trigger mask and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithograph with one-dimensional trigger mask and method of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4009505

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.