Liquid substance supply device for vaporizing system,...

Details Liquid substance supply device for vaporizing system,... Liquid substance supply device for vaporizing system,...

2008-07-24

2009-12-29

Bushey, Scott (Department: 1797)

Gas and liquid contact apparatus

Fluid distribution

Valved

C261S046000, C261S047000, C261S048000, C261S052000, C261S072100

Reexamination Certificate

active

07637482

ABSTRACT:
In a liquid substance supply device, a three port two valve directional control valve is provided in a transfer line, and a substance container and the transfer line are connected together by a four port three valve directional control valve in such a way that the four port three valve directional control valve and the substance container can be removed from the transfer line as a unit. Furthermore, in a vaporizer, an orifice member is provided to surround the end portion of an internal conduit in which flows a mixture substance consisting of a gas and a liquid substance mixed therewith, and gas for atomization is spouted into a vaporization chamber through a gap defined between the internal conduit and the orifice member. Yet further, the temperature of a vaporization surface in the vaporization chamber can be controlled independently in correspondence with the nature of the liquid substance.

REFERENCES:
patent: 3385113 (1968-05-01), Harris
patent: 4738693 (1988-04-01), Tom
patent: 5372754 (1994-12-01), Ono
patent: 5711816 (1998-01-01), Kirlin et al.
patent: 5837316 (1998-11-01), Fuchita et al.
patent: 5964254 (1999-10-01), Jackson
patent: 6039074 (2000-03-01), Raaijmakers et al.
patent: 6099653 (2000-08-01), Bhandari et al.
patent: 6157774 (2000-12-01), Komino et al.
patent: 6210485 (2001-04-01), Zhao et al.
patent: 6244291 (2001-06-01), Hughes
patent: 6273957 (2001-08-01), Yamamuka et al.
patent: 6349887 (2002-02-01), Pyo
patent: 6470144 (2002-10-01), Tarutani et al.
patent: 6511850 (2003-01-01), Vigh et al.
patent: 6596085 (2003-07-01), Schmitt et al.
patent: 6783118 (2004-08-01), Sivaramakrishnan et al.
patent: 7163197 (2007-01-01), Yoshioka et al.
patent: 7422198 (2008-09-01), Yoshioka et al.
patent: 63-203590 (1988-08-01), None
patent: 5-20323 (1993-03-01), None
patent: 5-68826 (1993-03-01), None
patent: 5-253402 (1993-10-01), None
patent: 7-94426 (1995-04-01), None
patent: 10-88354 (1998-04-01), None
patent: 10-89532 (1998-04-01), None
patent: 10-088354 (1998-07-01), None
patent: 10-251853 (1998-09-01), None
patent: 11-152571 (1999-06-01), None
patent: 11-345774 (1999-12-01), None
patent: 2000-42088 (2000-02-01), None
patent: 2000-199066 (2000-07-01), None
patent: 2001-152343 (2001-06-01), None
patent: 2001-250819 (2001-09-01), None
patent: 2001-262350 (2001-09-01), None
patent: 2002-105646 (2002-04-01), None
patent: 2002-110546 (2002-04-01), None
patent: 2004-96127 (2004-03-01), None
patent: 2004-116367 (2004-04-01), None
patent: WO 94/21840 (1994-09-01), None
Office Action dated Oct. 3, 2006 issued in corresponding Japanese Application No. 2000-292757.
Korean Office Action dated Jan. 11, 2008 issued in Korean Patent Application No. 10-2007-0046453.
Korean Office Action dated Aug. 21, 2007 issued in corresponding Korean Application No. 2000-44852.

Affiliated with

Also associated with

Rating

Liquid substance supply device for vaporizing system,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Liquid substance supply device for vaporizing system,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid substance supply device for vaporizing system,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4114557