Liquid source container device

Details Liquid source container device Liquid source container device

1990-12-28

1991-12-03

Cohan, Alan

Fluid handling

Diverse fluid containing pressure systems

Gas pressure storage over or displacement of liquid

137240, F17C 1300

Patent

active

050692445

ABSTRACT:
A liquid source container device is used for a liquid gas source for a semiconductor manufacturing device. This container device includes a main body for containing a source liquid, to which a gas supply line for transferring the source liquid, and a source liquid delivery line for delivering the liquid are connected. The gas supply line has first and second gas supply valves provided thereon, and the liquid delivery line has first and second liquid delivery valves also provided thereon. A section of the gas supply line which is located between the first and second gas supply valves and a section of the liquid delivery line which is located between the first and second delivery valves are connected with each other by means of a purge line which has a purge valve provided thereon. By operating the purge line, the purge valve, and the four valves, the efficiency of purge-drying procedures carried out before and after transferring the source liquid, is improved, and therefore the container device, as well as the semiconductor manufacturing device can be prevented from being contaminated.

REFERENCES:
patent: 4622988 (1986-11-01), Takimoto
patent: 4941593 (1990-07-01), Hicks
Patent Abstracts of Japan, vol. 13, No. 575 (C-667) [3923], 9/1989.

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