Liquid scrubbing of gas-phase contaminants

Details Liquid scrubbing of gas-phase contaminants Liquid scrubbing of gas-phase contaminants

1994-11-23

1996-06-18

Bos, Steven

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

423224, B01D 5352, B01D 5346, B01D 5378

Patent

active

055275176

ABSTRACT:
A main aspect of this invention is the provision of a liquid medium for scrubbing contaminants from an environmental gas-phase. Toxic chemicals such as phosphine and arsine are removed from a gas-phase stream by contacting the gas-phase stream with an aqueous medium which oxidizes the contaminants to water-soluble or water-dispersible type derivatives. The aqueous medium has a content of redox ingredients illustrated by compounds such as silver nitrate, hydrogen peroxide, sodium tungstate, and sulfuric acid.

REFERENCES:
patent: 2908546 (1959-10-01), Szatkowski
patent: 3617567 (1971-11-01), Mathre
patent: 4059048 (1977-11-01), Dickson
patent: 4144119 (1979-03-01), Dutkewych et al.
patent: 4370306 (1983-01-01), Kirchner et al.
patent: 4729835 (1988-03-01), McNeillie et al.
patent: 5098664 (1992-03-01), Schellhaas et al.
patent: 5207877 (1993-05-01), Weinberg et al.
Official Translation of JP-63-209,736, Kokai first published 31 Aug. 1988.
Perry, R. H., ed. "Chemical Engineers' Handbook," McGraw Hill: New York (1973) pp. 18-50 and 18-72.
Cotton, F. A., et al. "Advanced Inorganic Chemistry", Wiley-Interscience (1980), p. 156.

Affiliated with

Also associated with

Rating

Liquid scrubbing of gas-phase contaminants does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Liquid scrubbing of gas-phase contaminants, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid scrubbing of gas-phase contaminants will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-221054