Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1997-12-12
2000-08-08
Beck, Shrive
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
261142, 219394, C23C 1600
Patent
active
060996536
ABSTRACT:
A liquid reagent delivery and vaporization system, including a housing defining a flow passage for flow of a process fluid therethrough. A vaporizer element is positioned within the housing and includes a heated vaporization surface. Liquid reagent is selectively delivered to the heated vaporization surface, to vaporize the liquid reagent and form reagent vapor for flow through the flow passage of the housing, e.g., to a chemical vapor deposition reactor for deposition of a film on a substrate. A thermal damping fluid source is arranged to selectively deliver a thermal damping fluid into the flow passage to maintain a predetermined thermal condition therein. For example, the system may be arranged to selectively terminate delivery of liquid reagent to the vaporization surface and to contemporaneously selectively initiate delivery of the thermal damping fluid into the flow passage to maintain a thermal condition thermally matches the vaporization conditions when the liquid reagent is vaporized. The use of a thermal damping fluid prevents the occurrence of undesired thermal gradients in the system when the system is cyclically operated to vaporize reagent liquid.
REFERENCES:
patent: 5362328 (1994-11-01), Gardiner et al.
patent: 5536323 (1996-07-01), Kirlin et al.
patent: 5698037 (1997-12-01), Stauffer
patent: 5711816 (1998-01-01), Kirlin et al.
Baum Thomas H.
Bhandari Gautam
Advanced Technology & Materials Inc.
Beck Shrive
Hultquist Steven J.
MacArthur Sylvia R.
Zitzmann Oliver A. M.
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