Liquid processing method and liquid processing apparatus

Details Liquid processing method and liquid processing apparatus Liquid processing method and liquid processing apparatus

2011-03-29

2011-03-29

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S026000, C134S032000, C134S033000, C134S034000, C134S042000

Reexamination Certificate

active

07914626

ABSTRACT:
A liquid processing method includes: placing a plate adjacently to at least one of surfaces of a target substrate, and supplying a process liquid into a gap between the plate and the target substrate, thereby forming a liquid film of the process liquid; subjecting the target substrate to a process using a state with the liquid film of the process liquid thus formed; and supplying a gas to the liquid film, thereby breaking the liquid film, after finishing the process.

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Japanese Office Action issued on Sep. 7, 2010 for Japanese Patent Application No. 2005-339133 with English translation.
Japanese Office Action issued on Sep. 14, 2010 for Japanese Patent Application No. 2005-362809 with English translation.

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