Liquid processing apparatus processing a substrate surface...

Details Liquid processing apparatus processing a substrate surface... Liquid processing apparatus processing a substrate surface...

2008-01-08

2008-01-08

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S627000, C355S027000, C118S052000, C430S005000

Reexamination Certificate

active

07316515

ABSTRACT:
In a liquid processing apparatus a spin chuck holds a wafer having a surface supplied with a liquid to be applied through a nozzle receiving the liquid through a feed path and whether the liquid passing through the feed path has fluctuation is detected by a fluctuation detection device. Thus the liquid's condition in the feed path can be determined significantly accurately. Supplying the substrate with the liquid without fluctuation allows the substrate to receive the liquid in an optimal condition. A satisfactory liquid process can thus be performed.

REFERENCES:
patent: 3712203 (1973-01-01), Kishi et al.
patent: 4671309 (1987-06-01), Iemura et al.
patent: 4943735 (1990-07-01), Nishikawa
patent: 5223881 (1993-06-01), Nakagawa et al.
patent: 5570193 (1996-10-01), Landa et al.
patent: 6811962 (2004-11-01), Yoshihara et al.
patent: 2002/0164414 (2002-11-01), Okubo et al.
patent: 10-272407 (1998-10-01), None
patent: 2000-009655 (2000-01-01), None

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