Cleaning and liquid contact with solids – Processes – Including work heating or contact with combustion products
Reexamination Certificate
2001-02-15
2003-12-16
Markoff, Alexander (Department: 1746)
Cleaning and liquid contact with solids
Processes
Including work heating or contact with combustion products
C134S018000, C134S010000, C134S034000, C134S05600D, C134S0570DL, C134S902000, C134S105000, C134S113000
Reexamination Certificate
active
06663721
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Technical Field of the Invention
The present invention relates to a liquid processing apparatus and a liquid processing method. More in detail, the invention relates to the liquid processing apparatus and method of applying a predetermined liquid-process (e.g. cleaning process using chemical liquids) on an object to be processed, for example, a semiconductor wafer, a LCD glass substrate, etc.
2. Description of the Related Art
In process of manufacturing semiconductor devices, LCD glasses, etc., a liquid processing apparatus (method) using processing liquids is widely employed in order to remove residuals (polymer etc.) after drying process or resists adhering to the objects to be processed, for example, semiconductor wafers, LCD glasses, etc. Note, in this specification, the objects will be referred as “wafers etc.” hereinafter.
As the conventional liquid processing apparatus (method) of the above kind, a rotary liquid-processing apparatus (method) is also known. In this apparatus, a rotor carrying a plurality of wafers is accommodated in a processing chamber and then a processing liquid is supplied to the rotating wafers in order to clean them.
In accordance with the rotary liquid-processing apparatus (method), there can be accomplished a first process to clean the wafers etc. by supplying them with a processing (chemical) liquid; a second process to remove this chemical liquid by supplying another processing liquid (e.g. IPA); and a sequent drying process.
In the liquid processing method of this kind, meanwhile, it is desired to carry out the chemical process while using a chemical liquid of relatively-high temperature, for example, 80° C.
However, the above-mentioned rotary liquid-processing apparatus (method) has a problem that the temperature of the processing (chemical) liquid is extremely lowered to deteriorate the processing capability due to the supply of the processing liquid while rotating the wafers etc. Alternatively, in case of circulating the processing (chemical) liquid for use, it takes a lot of time to recover a target temperature of the liquid. Thus, there arises a problem that the processing efficiency is deteriorated.
As to the second process after the chemical process, when the above IPA etc. exhibiting high volatility is used as the other processing liquid, it is necessary to perform the second process while lowering a temperature of the atmosphere after the chemical process of high temperature. However, if it takes much of time to cool the atmosphere, then a problem arises in that the processing efficiency is deteriorated due to the elongation of “stand-by” period for the next-coming process.
SUMMARY OF THE INVENTION
Under the above-mentioned situation, the first object of the present invention resides in the provision of a liquid processing apparatus (also including the method) which are capable of both reduction in temperature-variation of the processing liquid at processing and shortening for temperature-recovery of the processing liquid thereby to improve the process efficiency. Additionally, the second object of the invention resides in the provision of the liquid processing apparatus (also including the method) which further facilitates the establishment of respective designated temperatures for different processes and which can carry out different processes continuously and effectively.
The first feature of the invention resides in a liquid processing apparatus for applying processing liquid on an object to be processed, comprising: a case; a processing chamber defined by the case to accommodate the object therein; a liquid supplier for supplying processing liquid to the object in the processing chamber; a case heat exchanger provided to the case and through which temperature-adjustment medium adjusted in temperature is able to flow and; a medium supplier connected with the case heat exchanger to supply the temperature-adjustment medium to the case heat exchanger.
With the constitution mentioned above, since it allows the temperature-adjustment medium to be supplied to the case heat exchanger outside the processing chamber by the medium supplier, it is possible to flow the temperature-adjustment medium about the outer periphery of the processing chamber at a process to supply the object with the processing liquid of a designated temperature. Consequently, the processing chamber including the interior of the chamber is controlled to be of a temperature of the processing liquid, reducing the change in temperature of the processing liquid, such as lowering or rising. Further, in case of circulating the processing liquid, it is possible to shorten a time for recovering the temperature of the processing liquid. Thus, the processing efficiency can be improved.
The second feature of the invention resides in that the medium supplier is connected with the case heat exchanger through switching device and also having a coolant source from which the temperature-adjustment medium as coolant is to be supplied.
The third feature of the invention resides in that the liquid processing apparatus of the second feature further comprises a controller for controlling switching operation of the switching device.
With the above-mentioned structure, it is possible to supply the case heat exchanger with the temperature-adjustment medium or the temperature-control cooling medium (coolant) selected by the switching operation of the switching means. Therefore, after completing the first process where the processing chamber including the interior of the chamber is controlled to be of a temperature of the processing liquid, it is possible to perform the second process to supply another processing liquid to the object while the processing chamber and the interior are together cooled by the flow of temperature-control cooling medium. Thus, it is possible to facilitate the establishment of respective designated temperatures for different process and also accomplish the different process continuously and effectively.
The fourth feature of the invention resides in a liquid processing apparatus for applying processing liquid on an object to be processed, comprising: a case; a holder for holding the object rotatably; a processing chamber surrounded by the case to accommodate the object and the holder therein; a liquid supplier for supplying processing liquid to the object in the processing chamber; and a case heat exchanger provided to the case.
The fifth feature of the invention resides in that temperature adjustment medium adjusted in temperature is able to flow through the case heat exchanger.
The sixth feature of the invention resides in that the processing chamber has a first processing chamber and a second processing chamber surrounding the first processing chamber; the case having a first case surrounding the first processing chamber and a second case surrounding the second processing chamber; the first case and the second case being constructed so as to be movable relatively; and the case heat exchanger being provided, at least, to the first case.
With the constitution mentioned above, since the interior of the processing chamber is adjusted in temperature by the case heat exchanger arranged about the outer periphery of the processing chamber, it is possible to minimize the temperature variations (lowering, rising, etc.) of the processing liquid in case of supplying the rotating object with the processing liquid of a designated temperature. Furthermore, in case of the supply of the processing liquid in circulation, then the above constitution allows a time for recovering the temperature of the processing liquid to be shortened.
The seventh feature of the invention resides in further comprising a medium supplier for supplying the temperature-adjustment medium to the case heat exchanger, whereby the temperature-adjustment medium supplied from the medium supplier flows through the case heat exchanger.
The eighth feature of the invention resides in further comprising a liquid temperature controller for controlling a temperature of the processing li
Egashira Koji
Tanaka Koji
Markoff Alexander
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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