Liquid processing apparatus and liquid processing method

Details Liquid processing apparatus and liquid processing method Liquid processing apparatus and liquid processing method

2007-03-27

2011-10-25

MacArthur, Sylvia R. (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

For liquid etchant

C156S345550, C118S320000

Reexamination Certificate

active

08043467

ABSTRACT:
A liquid processing apparatus is arranged to planarize a film on a substrate by supplying onto the film a process liquid for dissolving the film while rotating the substrate. The apparatus includes a substrate holding member configured to rotatably hold the substrate in a horizontal state, a rotation mechanism configured to rotate the substrate holding member, and a liquid supply mechanism configured to supply the process liquid onto a surface of the substrate. The liquid supply mechanism includes first and second liquid delivery nozzles configured to deliver the same process liquid. The first liquid delivery nozzle has a smaller diameter and provides a smaller delivery flow rate, as compared to the second liquid delivery nozzle. The first liquid delivery nozzle is inclined to deliver the process liquid in a rotational direction of the substrate, and is movable between a center of the substrate and a peripheral edge thereof.

REFERENCES:
patent: 5499733 (1996-03-01), Litvak
patent: 6096233 (2000-08-01), Taniyama et al.
patent: 6884294 (2005-04-01), Minami et al.
patent: 6964724 (2005-11-01), Yamasaki et al.
patent: 2003/0129850 (2003-07-01), Olgado et al.
patent: 2003/0196683 (2003-10-01), Izumi et al.
patent: 2004/0062861 (2004-04-01), Sato
patent: 2007/0137677 (2007-06-01), Nanba
patent: 2007/0231483 (2007-10-01), Nanba et al.
patent: 2004-6672 (2004-01-01), None
Korean Office Action issued on Jan. 18, 2011 for Application No. 10-2007-0029758 w/ partial English language translation.

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