Liquid processing apparatus and liquid processing method

Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...

Reexamination Certificate

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C134S153000, C134S902000

Reexamination Certificate

active

07337792

ABSTRACT:
A cleaning apparatus1includes a foup loading/unloading part2for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor34capable of holding the wafers W at half the normal pitch (half pitch), a wafer transporting device11for transporting the wafer E between the foup F and the rotor34,wafer posture changing devices20a,20b,a wafer elevating mechanism40,a motor31for rotating the rotor34,an outer chamber71aand an inner chamber71bboth accommodating the rotor34,and cleaning liquid nozzles53, 55for supplying a cleaning liquid to the wafers W. The rotor34holds the wafers W at intervals of an optional pitch (every one holding pitch or every plural holding pitches) to carry out a cleaning operation. Consequently, it is possible to process substrates accommodated in two containers at one batch processing.

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