Cleaning and liquid contact with solids – Apparatus – Automatic controls
Reexamination Certificate
2007-10-23
2007-10-23
Perrin, Joseph L. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
Automatic controls
C134S061000, C134S153000, C134S902000
Reexamination Certificate
active
10851335
ABSTRACT:
A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of the substrate rotating device at outside of the chamber such that a state of the substrate held by the holder changes between vertical and horizontal, and a position adjusting mechanism for relatively adjusting the positions of the chamber and the substrate rotating device together with the posture changing mechanism such that the holder is housed in the chamber. The substrate is taken out from the container and held by the holder in a horizontal state. After the posture of the holder was changed to vertical, a process liquid is supplied to the substrate of vertical state.
REFERENCES:
patent: 3889632 (1975-06-01), Brunner et al.
patent: 4300581 (1981-11-01), Thompson
patent: 5022419 (1991-06-01), Thompson et al.
patent: 5055036 (1991-10-01), Asano et al.
patent: 5095927 (1992-03-01), Thompson et al.
patent: 5107880 (1992-04-01), Pierson
patent: 5154199 (1992-10-01), Thompson et al.
patent: 5221360 (1993-06-01), Thompson et al.
patent: 5873177 (1999-02-01), Honda et al.
patent: 6009890 (2000-01-01), Kaneko et al.
patent: 6068002 (2000-05-01), Kamikawa et al.
patent: 6532975 (2003-03-01), Kamikawa et al.
patent: 6559461 (2003-05-01), Seo
patent: 6578592 (2003-06-01), Kamikawa et al.
patent: 6647642 (2003-11-01), Kamikawa et al.
patent: 6725868 (2004-04-01), Kamikawa et al.
patent: 6799586 (2004-10-01), Kamikawa et al.
patent: 2002/0029789 (2002-03-01), Egashira et al.
patent: 2001-77075 (2001-03-01), None
Perrin Joseph L.
Smith , Gambrell & Russell, LLP
Toktyo Electron Limited
LandOfFree
Liquid processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Liquid processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid processing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3851891