Coating apparatus – Gas or vapor deposition
Patent
1999-06-02
2000-10-17
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
118726, C23C 1600
Patent
active
061325155
ABSTRACT:
A system for delivering a liquid phase precursor fluid into a process chamber as a vapor phase fluid at constant pressure, the system comprising: a vaporizer for vaporizing the liquid phase precursor fluid prior to injecting the vapor phase fluid precursor into the process chamber, and a controllable device for transporting a preselected volume of the liquid phase fluid precursor from a reservoir to the vaporizer responsive to the pressure at the outlet of the vaporizer prior to entering the process chamber where the transport device is operated as the pressure at the outlet of the vaporizer canister drops, whereby system pressure perturbances are minimized prior to entering the process chamber.
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Schumacher Chemicals and Precursors Product Literature: FTES, TDMAT, TDEAT, CuTMVS, Tomcats, Extrema Tomcats, Extrema Diethylsilane, TEB, Extrema TMB, Extrema TMPI, TEPO, Extrema TEOS, 1994.
Cosmos Factory, Inc.
Lund Jeffrie R
Newhouse, Esq. David E.
Shahani, Esq. Ray K.
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