Liquid-phase growth method and liquid-phase growth apparatus

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Liquid phase epitaxial growth

Reexamination Certificate

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C117S013000, C117S056000

Reexamination Certificate

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06951585

ABSTRACT:
A liquid-phase growth method for immersing a polycrystalline substrate in a melt in a crucible wherein crystal ingredients are dissolved, thereby growing poly crystals upon the substrate, comprises a first step for growing poly crystals to a predetermined thickness, and a second step for melting back a part of the poly crystals grown in the first step in the melt, wherein the relative position between the substrate and melt is changed between the first step and second step, bringing melt with different temperature into contact with the polycrystalline surface. The obtained poly crystals have properties rivaling those of poly crystals used in conventional solar cells but with little risk of trouble such as line breakage of grid electrodes in application to solar cells, and can be obtained in great quantities at low costs.

REFERENCES:
patent: 6211038 (2001-04-01), Nakagawa et al.
patent: 2002/0009895 (2002-01-01), Nishida et al.
patent: 10-98205 (1998-04-01), None
Haruo Itoh et al., “Characterization of Silicon Layers Epitaxially Grown on Metallurgical-Grad Polychrystalline Substrates,” 45J. Crystal Growth446-453 (1978).
K.J. Weber et al., “Liquid Phase Epitaxy of Silicon on Multicrystalline Silicon Substrates,” 154J. Crystal Growth54-59 (1995).
G. Ballhorn et al., “High-Efficiency Multicrystalline Silicon Solar Cells by Liquid Epitaxy,” 52Solar Energy Materials and Solar Cells61-68 (1998).

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