Liquid phase epitaxy slider/stator assembly having non-wetting g

Details Liquid phase epitaxy slider/stator assembly having non-wetting g Liquid phase epitaxy slider/stator assembly having non-wetting g

1986-03-31

1987-10-06

McIntosh, John P.

Coating apparatus

Immersion or work-confined pool type

Work-confined pool

118415, 118421, B05C 309, H01L 738

Patent

active

046975438

ABSTRACT:
A slider/stator device for the growth of thin film material, such as mercury cadmium telluride, in which the substrate, thin film and growth solution are kept free from impurities by use of sleeves, made, for example, from sapphire, in order to prevent contamination and adhesion of the growth solution to the slider assembly.

REFERENCES:
patent: 3747562 (1973-07-01), Stone
patent: 4033291 (1977-07-01), Naito et al.
patent: 4317689 (1982-03-01), Bowers et al.
Journal of Crystal Growth, "Use of Sapphire Liners to Eliminate Edge Growth in LPE (Al,Ga)As," Tamargo et al, Feb. 1981, pp. 325-329.

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