Liquid phase epitaxy

Details Liquid phase epitaxy Liquid phase epitaxy

1974-12-19

1976-01-20

Kaplan, Morris

Coating apparatus

Immersion or work-confined pool type

With means to move tank or pool

148171, B05C 1112, H01L 738

Patent

active

039331237

ABSTRACT:
A method of and a device for the epitaxial deposition of a layer on a monocrystalline substrate from a material in the liquid state, in which during the deposition process apportioned quantities of a second material are added to the said material in the liquid state, a jig being used having a plurality of vertically spaced, fixed and slidable walls for controlling the addition. Application inter alia for the provision of semiconductor layers, for example, of material of the type A.sup.III B.sup.V, in particular from mixed crystals.

REFERENCES:
patent: 3565702 (1971-02-01), Nelson
patent: 3664294 (1972-05-01), Solomon
patent: 3665888 (1972-05-01), Bergh et al.

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