Liquid phase epitaxial reactor apparatus

Details Liquid phase epitaxial reactor apparatus Liquid phase epitaxial reactor apparatus

1975-11-17

1977-05-31

Wolk, Morris O.

Coating apparatus

Immersion or work-confined pool type

Work-confined pool

23273SP, 118423, 156422, 148172, B01D 900, B05C 302, B05C 318, H01L 4000

Patent

active

040262405

ABSTRACT:
A liquid phase epitaxial reactor is provided in which a simple cycling mechanism sequentially feeds semiconductor wafers from an input stack into a deposition region and thence to an output stack. In preferred embodiments, a cam is employed to tilt the output stack to accommodate the positioning of each successive wafer in the stack.

REFERENCES:
patent: 3809584 (1974-05-01), Akai et al.
patent: 3854447 (1974-12-01), Kobayashi
patent: 3899371 (1975-08-01), Ladany et al.
patent: 3940296 (1976-02-01), Van Oirschot et al.

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