Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1988-06-10
1992-11-10
Roy, Upendra
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
156610, 156621, 156623R, 505729, C01F 1700, C30B 900
Patent
active
051622971
ABSTRACT:
This invention provides a method of manufacturing of a superconducting oxide wafer in which a plural system oxide superconducting single crystal thin film is grown by the liquid epitaxy process using the flux on a crystal substrate.
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Fukuda Katsuyoshi
Terashima Kazutaka
Kabushiki Kaisha Toshiba
Roy Upendra
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