Liquid phase epitaxial growth apparatus wherein contacted wafer

Details Liquid phase epitaxial growth apparatus wherein contacted wafer Liquid phase epitaxial growth apparatus wherein contacted wafer

1975-02-27

1976-12-14

Emery, Stephen J.

Coating apparatus

Immersion or work-confined pool type

With means for moving work through, into or out of pool

148171, 427 84, 156607, 156622, 156DIG70, B05C 304, B01J 1704

Patent

active

039968910

ABSTRACT:
Apparatus for and methods of forming a liquid phase epitaxial growth layer on a semiconductor wafer by floating the wafer on a solution which forms the source of the epitaxial growth layer.

REFERENCES:
patent: 616821 (1898-12-01), Bock
patent: 2414679 (1947-01-01), West
patent: 2414680 (1947-01-01), West
patent: 2759803 (1956-08-01), Dauncey
patent: 2810366 (1957-10-01), Weiskopf et al.
patent: 3460510 (1969-08-01), Currin
patent: 3463680 (1969-08-01), Melngailis
patent: 3597171 (1971-08-01), Knippenberg
patent: 3765959 (1973-10-01), Unno
patent: 3783825 (1974-01-01), Kobayasi
patent: 3854447 (1974-12-01), Kobayashi

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