Chemistry of inorganic compounds – Sulfur or compound thereof – Oxygen containing
Patent
1992-10-29
1993-11-30
Lewis, Michael
Chemistry of inorganic compounds
Sulfur or compound thereof
Oxygen containing
423143, 423144, 423549, 423558, 423DIG1, 423DIG2, 210758, C01G 4914, C01G 4902
Patent
active
052662977
ABSTRACT:
A liquid oxidizing system has a closed circuit in which a liquid containing matter to be oxidized is circulated. The circuit is provided with an ejector for forming a jet stream of the liquid into which oxygen, or both oxygen and an oxidizing catalyst are supplied. The oxygen (and the catalyst) rapidly contacts the matter to be oxidized in the jet stream and oxidizes it. The system is not only applicable to the treatment of waste water, such as from factories, but also useful for making a product by oxidizing a liquid, e.g. iron polysulfate which is a good coagulant.
REFERENCES:
patent: 2128311 (1938-08-01), Mertes
patent: 2213907 (1940-09-01), Fleckenstein et al.
patent: 3947560 (1976-03-01), Nambu et al.
patent: 4234560 (1980-11-01), Kuerten et al.
Perry, Chemical Engineers Handbook, 4th Ed., McGraw Hill Book Co., 1963, pp. 21-13.
Chemical Abstracts, vol. 90, No. 12, Mar. 19, 1979, p. 110, Abstract No. 89451b.
Chemical Abstracts, vol. 107, No. 8, Aug. 24, 1987, p. 142, Abstract No. 61510r.
Chemical Abstracts, vol. 95, No. 14, Oct. 5, 1981, p. 135, Abstract No. 117818a.
Comprehensive Dictionary of Engineering and Technology, vol. IX by Dr.-Ing. Richard Ernst (1966).
The New Collins Dictionary and Thesaurus in One Volume (1986).
Chemical Engineers' Handbook (Fifth Edition) (1973).
Kalinchak Stephen G.
Lewis Michael
Sugita Wire Mfg. Co., Ltd.
LandOfFree
Liquid oxidizing method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Liquid oxidizing method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid oxidizing method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2093680