Liquid overflow tank combined with partition isolating two chamb

Details Liquid overflow tank combined with partition isolating two chamb Liquid overflow tank combined with partition isolating two chamb

1993-06-02

1994-08-30

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134114, 134182, 134902, 137574, B08B 304

Patent

active

053418255

ABSTRACT:
An overflow tank for rinsing an article such as a wafer with a liquid such as pure water is continuously supplied with the liquid. The tank comprises a partition isolating two adjacent chambers from each other, and is utilized as a passage for transferring an article from one of the chambers to the other chamber. The overflow tank has two opening sections that are opened at the two chambers, respectively, and each of the opening sections is defined by a continuous and level peripheral edge so that an overflow of the liquid can occur over all of the peripheral edge. During the passage of the article through the overflow tank, the article is rinsed with the water.

REFERENCES:
patent: 3987816 (1976-10-01), Lange
patent: 3990392 (1976-11-01), Andre
patent: 4090530 (1978-05-01), Lange
patent: 4092176 (1978-05-01), Kozai et al.
patent: 4354521 (1982-10-01), Harde
patent: 4736758 (1988-04-01), Kusuhara

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