Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-02-27
1995-10-17
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430171, 430176, G03F 7016
Patent
active
054590116
ABSTRACT:
A photosensitive composition including a water-soluble aromatic diazo compound having at least two diazo groups and lactic acid, hydroxyacetic acid or, a mixture thereof in an amount of at least one third by weight of the diazo compound. The photosensitive composition is in the form of a liquid or paste, is thus easy to handle, is suitable for use in the production of photosensitive printing plates, and has good storage stability.
REFERENCES:
patent: 3235382 (1966-02-01), Neugebauer et al.
patent: 3867147 (1975-02-01), Teuscher
patent: 3944422 (1976-03-01), Nihyakumen et al.
European Search Report (92 11 9735) EPA-32330.
Harada Kieko
Iida Hirotada
Tokuda Katsuyo
Bierman Jordan B.
Bowers Jr. Charles L.
Toyo Gosei Kogyo Co. Ltd.
Young Christopher G.
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