Coating apparatus – Gas or vapor deposition
Patent
1995-02-13
1997-05-20
Garrett, Felisa C.
Coating apparatus
Gas or vapor deposition
118725, 118726, C23C 1600
Patent
active
056308787
ABSTRACT:
A liquid flow meter is connected in series with a vaporizer having a vaporizing function and a flow rate-adjusting function and vaporizing a liquid material supplied through said liquid flow meter to compare a flow rate detected by the liquid flow meter with a set value, whereby controlling a quantity of liquid material introduced into a vaporizing chamber provided in said vaporizer on the basis of this comparison result, and thus a flow rate of vaporized gas can be always stably controlled in high-speed response.
REFERENCES:
patent: 5203925 (1993-04-01), Shibuya et al.
patent: 5252134 (1993-10-01), Stauffer
patent: 5372754 (1994-12-01), Ono
patent: 5383970 (1995-01-01), Asaba et al.
Ishikawa Kohichi
Kawano Takeshi
Miyamoto Hideaki
Garrett Felisa C.
Stec Inc.
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