Liquid material vaporizer apparatus and gas ejection device

Details Liquid material vaporizer apparatus and gas ejection device Liquid material vaporizer apparatus and gas ejection device

1997-04-07

2000-03-14

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118726, 392394, C23C 1600

Patent

active

060367830

ABSTRACT:
A vaporizer apparatus enables efficient vaporization of a liquid material for the production of high dielectric thin film devices by allowing a sufficient dwell time for complete vaporization of the feed liquid. The vaporizer apparatus also prevents degradation of the feed gas after vaporization and provides a stable supply of the vaporized feed gas to the substrate. The vaporizer apparatus comprises an outer member having a cylindrical inner surface, and an inner member having a cylindrical outer surface opposing the cylindrical inner surface of the outer member. A feed material passage having a spiral configuration is formed on at least one of the cylindrical inner surface and the cylindrical outer surface. The feed material passage communicates with a feed liquid entry opening and a feed gas exit opening. A heating device is provided for heating at least one of the outer member and inner member.

REFERENCES:
patent: 4847469 (1989-07-01), Hofmann
patent: 5224202 (1993-06-01), Arnold et al.
patent: 5252134 (1993-10-01), Stauffer
patent: 5435850 (1995-07-01), Rasmussen
patent: 5462014 (1995-10-01), Awaya
Patent Abstracts of Japan, vol. 014, No. 390 (C-0751), Aug. 23, 1990 & JP 02 145768 A (Koujiyundo Kagaku Kenkyusho:KK), Jun. 5, 1990 *abstract*.

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