Liquid material vaporization apparatus for semiconductor...

Details Liquid material vaporization apparatus for semiconductor... Liquid material vaporization apparatus for semiconductor...

2007-01-24

2010-11-16

Hoang, Tu B (Department: 3742)

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

C392S394000, C392S402000, C392S405000, C422S228000, C422S236000

Reexamination Certificate

active

07833353

ABSTRACT:
A liquid material vaporization apparatus for a semiconductor processing apparatus includes: a vaporization tank; an inner partition wall disposed in the tank for dividing the interior of the tank into a charging compartment and a vaporization compartment which are liquid-communicatable with each other over an upper edge of the inner partition wall. A liquid material charged in the charging compartment overflows over the upper edge of the inner partition wall toward the vaporization compartment to store and vaporize the liquid material in the vaporization compartment.

REFERENCES:
patent: 87192 (1869-02-01), Paine
patent: 113147 (1871-03-01), Dupas et al.
patent: 160410 (1875-03-01), Ferguson
patent: 230656 (1880-08-01), Radkey
patent: 1103789 (1914-07-01), Macey
patent: 1525786 (1925-02-01), Waldo
patent: 1736325 (1929-11-01), Parmelee
patent: 1860111 (1932-05-01), Miller
patent: 2206688 (1940-07-01), Bloomheart
patent: 2333898 (1943-11-01), Stevenson et al.
patent: 3731802 (1973-05-01), James
patent: 3912795 (1975-10-01), Jackson
patent: 3957467 (1976-05-01), Kim
patent: 3989477 (1976-11-01), Wilson et al.
patent: 4268279 (1981-05-01), Shindo et al.
patent: 4276243 (1981-06-01), Partus
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4393013 (1983-07-01), McMenamin
patent: 4436674 (1984-03-01), McMenamin
patent: 4548138 (1985-10-01), Korenberg
patent: 4774032 (1988-09-01), Coates et al.
patent: 4783343 (1988-11-01), Sato
patent: 4883362 (1989-11-01), Gärtner et al.
patent: 4904419 (1990-02-01), Reynolds
patent: 4911101 (1990-03-01), Ballingall, III et al.
patent: 4947790 (1990-08-01), Gärtner et al.
patent: 5053132 (1991-10-01), Sirkar
patent: 5143526 (1992-09-01), Lee et al.
patent: 5199603 (1993-04-01), Prescott
patent: 5385689 (1995-01-01), Tom et al.
patent: 5543043 (1996-08-01), Bates et al.
patent: 5551278 (1996-09-01), Rounbehler et al.
patent: 5674574 (1997-10-01), Atwell et al.
patent: 5698037 (1997-12-01), Stauffer
patent: 5711816 (1998-01-01), Kirlin et al.
patent: 5904771 (1999-05-01), Tasaki et al.
patent: 6033493 (2000-03-01), Hertz et al.
patent: 6132492 (2000-10-01), Hultquist et al.
patent: 6220091 (2001-04-01), Chen et al.
patent: 6231641 (2001-05-01), Utigard et al.
patent: 6325017 (2001-12-01), DeBoer et al.
patent: 6582496 (2003-06-01), Cheng et al.
patent: 6868869 (2005-03-01), Olander
patent: 6905541 (2005-06-01), Chen et al.
patent: 7156380 (2007-01-01), Soininen
patent: 7186385 (2007-03-01), Ganguli et al.
patent: 7270709 (2007-09-01), Chen et al.
patent: 7464917 (2008-12-01), Lee et al.
patent: 2001/0042523 (2001-11-01), Kesala
patent: 2002/0007849 (2002-01-01), Wang et al.
patent: 2003/0053799 (2003-03-01), Lei
patent: 2004/0016404 (2004-01-01), Gregg et al.
patent: 2005/0072357 (2005-04-01), Shero et al.
patent: 2005/0263075 (2005-12-01), Wang et al.
patent: 33 39 625 (1991-01-01), None
patent: 2 151 662 (1985-07-01), None
patent: 011 168092 (1999-06-01), None
patent: 2002-90077 (2002-03-01), None
patent: 2002-220669 (2002-08-01), None
patent: 2006045637 (2006-02-01), None
patent: WO 2004/011695 (2004-02-01), None
Leskelä et al., “ALS precursor chemistry: Evolution and future challenges,”Journal de PhysiqueIV France 9, 837-852.
Smith, J.M.,Chemical Engineering Kinetics, 3rdEdition, McGraw-Hill Book Company, p. 268-291 (1981).
Smith, J.M.,Chemical Engineering Kinetics, 3rdEdition, McGraw-Hill Book Company, p. 554-563 (1981).
Suntola, “Atomic Layer Epitaxy,”Thin Solid Films, 216: 84-89 (1992).

Affiliated with

Also associated with

Rating

Liquid material vaporization apparatus for semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Liquid material vaporization apparatus for semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid material vaporization apparatus for semiconductor... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4245548