Liquid material supply system and method for semiconductor...

Details Liquid material supply system and method for semiconductor... Liquid material supply system and method for semiconductor...

2005-08-23

2005-08-23

Lebentritt, Michael (Department: 2812)

Semiconductor device manufacturing: process

Chemical etching

C118S319000, C118S052000

Reexamination Certificate

active

06933233

ABSTRACT:
A liquid material supply system in which an inert gas is injected into a material tank accommodating a liquid material so as to discharge the liquid material into a liquid material discharge pipe connected to the material tank and that the inert gas dissolved or mixed in the discharged liquid material is trapped by a gas trap provided on the liquid material discharge pipe, is constructed in such a manner that when a dissolution temperature characteristic of the inert gas with respect to the liquid material is negative, an upstream side of the liquid material discharge pipe with respect to the gas trap is heated while the downstream side of the liquid material discharge pipe with respect to the gas trap is cooled.

REFERENCES:
patent: 4544446 (1985-10-01), Cady
patent: 5746904 (1998-05-01), Lee
patent: 5935331 (1999-08-01), Naka et al.
patent: 6679272 (2004-01-01), Bran et al.
patent: 6695926 (2004-02-01), Koyanagi et al.

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