Liquid material supply apparatus and method

Coating processes – Coating by vapor – gas – or smoke

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Details

427252, 427901, 134 21, 134 2211, 134 2212, 134 2214, 134 2218, 134 2219, C23C 1600

Patent

active

061269948

ABSTRACT:
An apparatus for supplying a low vapor pressure liquid material for deposition to a deposition chamber in which the low vapor pressure liquid material is pushed out of a pressurization passage by a pressure gas to a pressure liquid supply passage; a flow rate of the low vapor pressure liquid material is controlled by a flow rate control unit, and the flow rate of the low vapor pressure liquid is supplied to an evaporator and evaporated into vapor there; and the vapor is fed to the deposition chamber through a vapor feed passage provided with heating means for preventing the vapor from re-liquefying, whereby the liquid material for deposition is supplied stably and accurately.

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