Liquid material evaporation apparatus for semiconductor...

Details Liquid material evaporation apparatus for semiconductor... Liquid material evaporation apparatus for semiconductor...

2006-10-03

2006-10-03

Manoharan, Virginia (Department: 1764)

Concentrating evaporators

Gaseous blast or current

C159S044000, C118S726000, C261S075000, C261S095000, C261S096000, C261S097000, C261SDIG065, C261S038000, C261S062000, C261S066000

Reexamination Certificate

active

07115186

ABSTRACT:
A liquid material evaporation apparatus including a mixing chamber, a flow control unit, a first flow passage for introducing a liquid material, a second flow passage for introducing a carrier gas connected to the mixing chamber through a first nozzle, the first nozzle inhibiting backflow from the mixing chamber into the second flow passage. A third flow passage for discharging evaporated mixed gas is connected to the mixing chamber through a second nozzle, the mixed liquid material and carrier gas being forced through the second nozzle by the flow control unit, the mixed liquid material and carrier gas depressurizing after passing through the second nozzle to evaporate into a mixed gas in the third flow passage. Heat is applied to the mixing chamber and the second and third flow passages to enhance mixing in the mixing chamber and to avoid condensation in the third flow passage.

REFERENCES:
patent: 4368100 (1983-01-01), Pyves et al.
patent: 6162734 (2000-12-01), Bergman et al.
patent: 6224681 (2001-05-01), Sivaramakrishnan et al.
patent: 6752387 (2004-06-01), Nishizato et al.
patent: 6783118 (2004-08-01), Sivaramakrishnan et al.
patent: 6830608 (2004-12-01), Peters
patent: 11-124674 (1999-11-01), None
patent: 2001-335940 (2001-07-01), None

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