Liquid immersion type exposure apparatus

Details Liquid immersion type exposure apparatus Liquid immersion type exposure apparatus

2006-10-03

2006-10-03

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07116395

ABSTRACT:
Disclosed is a liquid immersion type exposure apparatus specifically arranged to maintain a liquid film between an exposure substrate and a terminal end portion of a projection optical system. In one preferred form, the liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting disappearance of at least a portion of the liquid film in the predetermined region.

REFERENCES:
patent: 5610683 (1997-03-01), Takahashi
patent: 5825043 (1998-10-01), Suwa
patent: 2004/0103950 (2004-06-01), Iriguchi
patent: 2005/0132914 (2005-06-01), Mulkens et al.
patent: 2005/0134817 (2005-06-01), Nakamura
patent: 57-153433 (1982-09-01), None
patent: 06-124873 (1994-05-01), None
patent: WO99/49504 (1999-09-01), None

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