Liquid immersion type exposure apparatus

Details Liquid immersion type exposure apparatus Liquid immersion type exposure apparatus

2006-05-30

2006-05-30

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07053983

ABSTRACT:
Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.

REFERENCES:
patent: 5825043 (1998-10-01), Suwa
patent: 6522385 (2003-02-01), Ahn et al.
patent: 6867844 (2005-03-01), Vogel et al.
patent: 06-124873 (1994-05-01), None
patent: WO 99/49504 (1999-09-01), None

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