Liquid immersion lithography system with tilted liquid flow

Details Liquid immersion lithography system with tilted liquid flow Liquid immersion lithography system with tilted liquid flow

2007-08-07

2007-08-07

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S077000

Reexamination Certificate

active

11586639

ABSTRACT:
A liquid immersion lithography system including a projection optical system for directing electromagnetic radiation onto a substrate, and a showerhead for delivering liquid flow between the projection optical system and the substrate. The showerhead includes an injection nozzle and a retrieval nozzle located at different heights. The liquid flow is tilted relative to the substrate. A direction from the injection nozzle to the retrieval nozzle is tilted at approximately 1 to 2 degrees relative to the substrate.

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