Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2007-11-29
2011-10-18
Nguyen, Hung Henry (Department: 2882)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S027000, C355S053000, C355S072000
Reexamination Certificate
active
08040490
ABSTRACT:
A liquid immersion exposure apparatus includes: a first optical member having an exit surface via which an exposure beam exits; a first movable body movable with respect to the first optical member while holding a substrate; a cover member movable with movement of the first movable body and capable of retaining a liquid in a space formed between the exit surface and the cover member when the cover member is arranged at a position opposite to the exit surface; a first holding portion provided on the first movable body and holding the cover member; and a transport section removing the cover member from the first holding portion and moving the cover member independently from the first movable body. Upon exposing the substrate through the liquid, it is possible to suppress the deterioration of the performance which would be otherwise caused due to the cover member.
REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 7110081 (2006-09-01), Hoogendam et al.
patent: 7224436 (2007-05-01), Derksen et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2005/0219489 (2005-10-01), Nei et al.
patent: 2006/0103818 (2006-05-01), Holmes et al.
patent: 2006/0103820 (2006-05-01), Donders et al.
patent: 2006/0126037 (2006-06-01), Jansen et al.
patent: 2006/0132731 (2006-06-01), Jansen et al.
patent: 2006/0250588 (2006-11-01), Brandl
patent: 2007/0177125 (2007-08-01), Shibazaki
patent: 2007/0285639 (2007-12-01), Liang et al.
patent: 2008/0018867 (2008-01-01), Fujiwara et al.
patent: 2009/0002658 (2009-01-01), Kiuchi
patent: 221563 (1985-04-01), None
patent: 224448 (1985-07-01), None
patent: A-58-202448 (1983-11-01), None
patent: A-59-19912 (1984-02-01), None
patent: A-62-065326 (1987-03-01), None
patent: A-63-157419 (1988-06-01), None
patent: A-4-305915 (1992-10-01), None
patent: A-4-305917 (1992-10-01), None
patent: A-5-062877 (1993-03-01), None
patent: A-6-124873 (1994-05-01), None
patent: A-7-220990 (1995-08-01), None
patent: A-8-316125 (1996-11-01), None
patent: A-10-303114 (1998-11-01), None
patent: A-10-340846 (1998-12-01), None
patent: A-11-176727 (1999-07-01), None
patent: A-2000-058436 (2000-02-01), None
patent: A-2004-289128 (2004-10-01), None
patent: A-2006-140498 (2006-06-01), None
patent: A-2006-147776 (2006-06-01), None
patent: A-2006-173620 (2006-06-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2005/122219 (2005-12-01), None
patent: WO 2006062065 (2006-06-01), None
patent: WO 2007/029829 (2007-03-01), None
International Search Report issued in International Patent Application No. PCT/JP2007/073250 dated Mar. 4, 2008 with English Translation.
Written Opinion issued in International Patent Application No. PCT/JP2007/073250dated Mar. 4, 2008 with English Translation.
Kreutzer Colin
Nguyen Hung Henry
Nikon Corporation
Oliff & Berridg,e PLC
LandOfFree
Liquid immersion exposure apparatus, exposure method, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Liquid immersion exposure apparatus, exposure method, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid immersion exposure apparatus, exposure method, and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4273237