Liquid for immersion exposure and immersion exposure method

Details Liquid for immersion exposure and immersion exposure method Liquid for immersion exposure and immersion exposure method

2005-05-19

2009-08-25

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07580111

ABSTRACT:
An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.

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Inside Memory, Nikkei Microdevice, p. 77-86 (Apr. 2004).
Smith, et al., Approaching the numerical aperture of water-Immersion lithography at 193nm, Proc. SPIE, Vol. 5377, pp. 273-284 (2004).
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The seminar text of special seminar on immersion exposure technology, pp. 14-33 (May 27, 2004).

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