Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2006-06-19
2010-06-08
Alanko, Anita K (Department: 1792)
Etching a substrate: processes
Forming or treating thermal ink jet article
C216S052000, C216S053000, C216S083000, C216S084000, C216S099000, C438S021000, C029S890100
Reexamination Certificate
active
07731861
ABSTRACT:
A liquid drop discharge head includes a chip21that is formed by separation of a silicon wafer20. The silicon wafer20has a first direction and a second direction which are mutually intersected. The chip21is separated from the silicon wafer20by etching the wafer along a separation line22parallel to the first direction of the wafer and by dicing the wafer20along a separation line23parallel to the second direction of the wafer.
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Hashimoto Kenichiroh
Mimura Tadashi
Alanko Anita K
Cooper & Dunham LLP
Ricoh & Company, Ltd.
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